Hf solution

100µg/ml,5% HNO3 and tr. HF

Product Code: 93588

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EC Number:	MDL Number:
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Density:	Storage Condition:	2~8°C

Product Description: Hf solution is primarily used in the semiconductor industry for the deposition of hafnium oxide (HfO₂) thin films, which serve as high-k dielectric materials in advanced transistors. These films are crucial for reducing leakage current and improving the performance of microelectronic devices. Additionally, the solution is employed in the production of specialized coatings that enhance the thermal and chemical resistance of components in aerospace and nuclear applications. Its role in catalysis is also notable, particularly in processes requiring high-temperature stability and efficiency.

Product Specification:

Test	Specification
APPEARANCE	liquid
Solvent	5 HNO3 and tr. HF
Concentration	100gml
Infrared spectrum	Conforms to Structure

Sizes / Availability / Pricing:

Size (g)	Availability	Price	Quantity
50.000	10-20 days	฿2,980.00	+ -
100.000	10-20 days	฿5,180.00	+ -
500.000	10-20 days	฿21,800.00	+ -

Hf solution

Hf solution is primarily used in the semiconductor industry for the deposition of hafnium oxide (HfO₂) thin films, which serve as high-k dielectric materials in advanced transistors. These films are crucial for reducing leakage current and improving the performance of microelectronic devices. Additionally, the solution is employed in the production of specialized coatings that enhance the thermal and chemical resistance of components in aerospace and nuclear applications. Its role in catalysis is also notable, particularly in processes requiring high-temperature stability and efficiency.

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Hf solution

100µg/ml,5% HNO3 and tr. HF

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