Hf solution
100µg/ml,5% HNO3 and tr. HF
- Product Code: 93588
| Molecular Weight: | Molecular Formula: | ||
|---|---|---|---|
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| Density: | Storage Condition: | 2~8°C |
Product Description:
Hf solution is primarily used in the semiconductor industry for the deposition of hafnium oxide (HfO₂) thin films, which serve as high-k dielectric materials in advanced transistors. These films are crucial for reducing leakage current and improving the performance of microelectronic devices. Additionally, the solution is employed in the production of specialized coatings that enhance the thermal and chemical resistance of components in aerospace and nuclear applications. Its role in catalysis is also notable, particularly in processes requiring high-temperature stability and efficiency.
Product Specification:
| Test | Specification |
|---|---|
| Appearance | liquid |
| Solvent | 5 HNO3 and trace HF |
| Concentration | 100 g/ml |
| Infrared Spectrum | Conforms to Structure |
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 50ml | 10-20 days | Ft30,490.77 |
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| 100ml | 10-20 days | Ft53,000.73 |
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| 500ml | 10-20 days | Ft223,053.28 |
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Hf solution
Hf solution is primarily used in the semiconductor industry for the deposition of hafnium oxide (HfO₂) thin films, which serve as high-k dielectric materials in advanced transistors. These films are crucial for reducing leakage current and improving the performance of microelectronic devices. Additionally, the solution is employed in the production of specialized coatings that enhance the thermal and chemical resistance of components in aerospace and nuclear applications. Its role in catalysis is also notable, particularly in processes requiring high-temperature stability and efficiency.
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