2-Methyladamantan-2-yl Acrylate
≥98%, with stabilizer MEHQ
- Product Code: 95068
CAS:
249562-06-9
| Molecular Weight: | 220.31 g./mol | Molecular Formula: | C₁₄H₂₀O₂ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD08704223 | |
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | room temperature, dry |
Product Description:
This chemical is primarily used in the development of advanced photoresist materials, which are critical in the semiconductor manufacturing process. It plays a key role in creating high-resolution patterns on silicon wafers, enabling the production of smaller and more efficient electronic components. Additionally, its unique structure contributes to the thermal and chemical stability of the photoresist, ensuring durability during the etching and development stages. Beyond semiconductors, it is also explored in the synthesis of specialty polymers, where its properties enhance the performance of coatings and adhesives in demanding industrial applications.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 1.000 | 10-20 days | Ft19,102.49 |
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| 5.000 | 10-20 days | Ft55,562.07 |
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2-Methyladamantan-2-yl Acrylate
This chemical is primarily used in the development of advanced photoresist materials, which are critical in the semiconductor manufacturing process. It plays a key role in creating high-resolution patterns on silicon wafers, enabling the production of smaller and more efficient electronic components. Additionally, its unique structure contributes to the thermal and chemical stability of the photoresist, ensuring durability during the etching and development stages. Beyond semiconductors, it is also explored in the synthesis of specialty polymers, where its properties enhance the performance of coatings and adhesives in demanding industrial applications.
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