(4-Hydroxyphenyl)methyl(2-methylbenzyl)sulfonium Hexafluoroantimonate
≥98%
- Product Code: 95477
CAS:
141651-31-2
| Molecular Weight: | 481.11 g./mol | Molecular Formula: | C₁₅H₁₇F₆OSSb |
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| EC Number: | MDL Number: | ||
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | room temperature, dry |
Product Description:
This chemical is primarily used as a photoacid generator (PAG) in advanced photoresist formulations for the semiconductor industry. When exposed to ultraviolet (UV) light, it releases strong acids that catalyze the chemical changes needed to create precise patterns on silicon wafers during the lithography process. Its high sensitivity and efficiency make it suitable for manufacturing microchips and other electronic components with nanoscale precision. Additionally, it is valued for its thermal stability and compatibility with various resist materials, ensuring consistent performance in high-resolution imaging applications.
Product Specification:
| Test | Specification |
|---|---|
| APPEARANCE | White - Almost white Crystal - Powder |
| PURITY | 97.5-100 |
| Infrared spectrum | Conforms to Structure |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 1.000 | 10-20 days | ฿2,660.00 |
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| 5.000 | 10-20 days | ฿9,054.00 |
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(4-Hydroxyphenyl)methyl(2-methylbenzyl)sulfonium Hexafluoroantimonate
This chemical is primarily used as a photoacid generator (PAG) in advanced photoresist formulations for the semiconductor industry. When exposed to ultraviolet (UV) light, it releases strong acids that catalyze the chemical changes needed to create precise patterns on silicon wafers during the lithography process. Its high sensitivity and efficiency make it suitable for manufacturing microchips and other electronic components with nanoscale precision. Additionally, it is valued for its thermal stability and compatibility with various resist materials, ensuring consistent performance in high-resolution imaging applications.
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