Tri-p-tolylsulfonium Trifluoromethanesulfonate
≥95%
- Product Code: 95501
CAS:
127820-38-6
| Molecular Weight: | 454.52 g./mol | Molecular Formula: | C₂₂H₂₁F₃O₃S₂ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD06797188 | |
| Melting Point: | 105-111°C | Boiling Point: | |
| Density: | Storage Condition: | room temperature |
Product Description:
Used primarily in photolithography processes within the semiconductor industry, it serves as a key component in photoresist formulations. Its high photosensitivity enables precise patterning on silicon wafers, essential for manufacturing integrated circuits and microelectronic devices. Additionally, it is employed in advanced material synthesis, particularly in the development of polymers and coatings that require controlled curing or cross-linking under UV light. Its stability and efficiency make it a preferred choice for high-resolution imaging applications in electronics and nanotechnology.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.200 | 10-20 days | $89.65 |
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| 1.000 | 10-20 days | $215.75 |
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Tri-p-tolylsulfonium Trifluoromethanesulfonate
Used primarily in photolithography processes within the semiconductor industry, it serves as a key component in photoresist formulations. Its high photosensitivity enables precise patterning on silicon wafers, essential for manufacturing integrated circuits and microelectronic devices. Additionally, it is employed in advanced material synthesis, particularly in the development of polymers and coatings that require controlled curing or cross-linking under UV light. Its stability and efficiency make it a preferred choice for high-resolution imaging applications in electronics and nanotechnology.
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