Tri-p-tolylsulfonium Hexafluorophosphate
≥90%
- Product Code: 95503
CAS:
146062-15-9
| Molecular Weight: | 450.42 g./mol | Molecular Formula: | C₂₁H₂₁F₆PS |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD06797187 | |
| Melting Point: | 168-173°C | Boiling Point: | |
| Density: | Storage Condition: | room temperature |
Product Description:
Used primarily as a photoacid generator (PAG) in photoresist formulations for the semiconductor industry. It plays a critical role in lithography processes, where it generates acid upon exposure to ultraviolet (UV) light, enabling the patterning of microelectronic components. Its stability and efficiency make it suitable for advanced manufacturing of integrated circuits and microchips. Additionally, it finds application in the production of high-resolution displays and other nanotechnology-based devices.
Product Specification:
| Test | Specification |
|---|---|
| APPEARANCE | White to Almost white powder to crystaline |
| PURITY | 90-100 |
| Infrared spectrum | Conforms to Structure |
| MELTING POINT | 170.0-175.0 |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.250 | 10-20 days | $99.01 |
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Tri-p-tolylsulfonium Hexafluorophosphate
Used primarily as a photoacid generator (PAG) in photoresist formulations for the semiconductor industry. It plays a critical role in lithography processes, where it generates acid upon exposure to ultraviolet (UV) light, enabling the patterning of microelectronic components. Its stability and efficiency make it suitable for advanced manufacturing of integrated circuits and microchips. Additionally, it finds application in the production of high-resolution displays and other nanotechnology-based devices.
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