Tetrakis(dimethylamino)zirconium
≥98%
- Product Code: 242250
CAS:
19756-04-8
| Molecular Weight: | 267.53 g./mol | Molecular Formula: | C₈H₂₄N₄Zr |
|---|---|---|---|
| EC Number: | MDL Number: | ||
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | 2-8℃, drying, inert gas storage |
Product Description:
Used as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes for the formation of zirconium-containing thin films. These films serve as high-k dielectrics in semiconductor devices, offering improved gate insulation in transistors. The compound’s volatility and thermal stability make it suitable for low-temperature deposition, enabling integration into advanced microelectronic fabrication. It is also explored in catalysis and materials science for synthesizing zirconium-based nanomaterials and metal-organic frameworks.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 0.250 | 10-20 days | ฿1,800.00 |
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| 1.000 | 10-20 days | ฿6,800.00 |
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| 5.000 | 10-20 days | ฿22,910.00 |
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Tetrakis(dimethylamino)zirconium
Used as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes for the formation of zirconium-containing thin films. These films serve as high-k dielectrics in semiconductor devices, offering improved gate insulation in transistors. The compound’s volatility and thermal stability make it suitable for low-temperature deposition, enabling integration into advanced microelectronic fabrication. It is also explored in catalysis and materials science for synthesizing zirconium-based nanomaterials and metal-organic frameworks.
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