3-(4,5-Dimethoxy-2-nitrophenyl)acrylic acid
98%
- Product Code: 44326
CAS:
20567-38-8
| Molecular Weight: | 253.2100 g./mol | Molecular Formula: | C₁₁H₁₁NO₆ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00017017 | |
| Melting Point: | Boiling Point: | ||
| Density: | Storage Condition: | room temperature |
Product Description:
This compound is primarily utilized in the field of organic synthesis and material science. It serves as a key intermediate in the production of photoresists, which are essential in the manufacturing of semiconductors and microelectronic devices. Its photochemical properties make it suitable for applications in photolithography, where it helps in creating precise patterns on silicon wafers. Additionally, it is explored in the development of light-sensitive polymers and coatings, contributing to advancements in optoelectronic materials. Its unique structure also allows for potential use in the synthesis of bioactive molecules for pharmaceutical research.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 1.000 | 10-20 days | ฿324.00 |
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3-(4,5-Dimethoxy-2-nitrophenyl)acrylic acid
This compound is primarily utilized in the field of organic synthesis and material science. It serves as a key intermediate in the production of photoresists, which are essential in the manufacturing of semiconductors and microelectronic devices. Its photochemical properties make it suitable for applications in photolithography, where it helps in creating precise patterns on silicon wafers. Additionally, it is explored in the development of light-sensitive polymers and coatings, contributing to advancements in optoelectronic materials. Its unique structure also allows for potential use in the synthesis of bioactive molecules for pharmaceutical research.
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