Tetrakis(ethylmethylamino)hafnium
99%
- Product Code: 54410
CAS:
352535-01-4
| Molecular Weight: | 410.9 g./mol | Molecular Formula: | C₁₂H₃₂HfN₄ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD03427130 | |
| Melting Point: | -50℃ | Boiling Point: | 79℃0.1 mm Hg(lit.) |
| Density: | 1.324 g/mL at 25℃(lit.) | Storage Condition: | 2-8℃ |
Product Description:
Used as a precursor in the deposition of hafnium oxide thin films, which are critical in the manufacturing of advanced semiconductor devices. It plays a key role in atomic layer deposition (ALD) processes, enabling precise control over film thickness and uniformity. This chemical is particularly valuable in the production of high-k dielectric materials for transistors, enhancing their performance and efficiency in microelectronics. Additionally, it is employed in the development of protective coatings and specialized optical films, contributing to advancements in nanotechnology and materials science.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 5.000 | 10-20 days | ฿10,854.00 |
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Tetrakis(ethylmethylamino)hafnium
Used as a precursor in the deposition of hafnium oxide thin films, which are critical in the manufacturing of advanced semiconductor devices. It plays a key role in atomic layer deposition (ALD) processes, enabling precise control over film thickness and uniformity. This chemical is particularly valuable in the production of high-k dielectric materials for transistors, enhancing their performance and efficiency in microelectronics. Additionally, it is employed in the development of protective coatings and specialized optical films, contributing to advancements in nanotechnology and materials science.
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