Tetrakis(diethylamido)titanium(IV)
99.999% trace metals basis
- Product Code: 68473
CAS:
4419-47-0
| Molecular Weight: | 336.38 g./mol | Molecular Formula: | C₁₆H₄N₄Ti |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00015648 | |
| Melting Point: | 4 °C | Boiling Point: | 112 °C0.1 mm Hg(lit.) |
| Density: | 0.931 g/mL at 25 °C(lit.) | Storage Condition: | room temperature |
Product Description:
Used as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to create thin films of titanium nitride or titanium dioxide. These films are essential in semiconductor manufacturing, providing protective or insulating layers on electronic components. It is also employed in the production of advanced ceramics and coatings, enhancing durability and performance in high-temperature or corrosive environments. Additionally, it plays a role in catalysis for organic synthesis, enabling efficient and selective chemical reactions. Its application in nanotechnology contributes to the development of nanostructured materials with tailored properties.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
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| 5.000 | 10-20 days | $293.78 |
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| 10.000 | 10-20 days | $411.14 |
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| 25.000 | 10-20 days | $934.40 |
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Tetrakis(diethylamido)titanium(IV)
Used as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to create thin films of titanium nitride or titanium dioxide. These films are essential in semiconductor manufacturing, providing protective or insulating layers on electronic components. It is also employed in the production of advanced ceramics and coatings, enhancing durability and performance in high-temperature or corrosive environments. Additionally, it plays a role in catalysis for organic synthesis, enabling efficient and selective chemical reactions. Its application in nanotechnology contributes to the development of nanostructured materials with tailored properties.
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