(4-Iodophenyl)diphenylsulfonium triflate
- Product Code: 73141
CAS:
255056-46-3
| Molecular Weight: | 538.34 g./mol | Molecular Formula: | C₁₉H₁₄F₃IO₃S₂ |
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| EC Number: | MDL Number: | ||
| Melting Point: | 155 - 160 °C - lit. | Boiling Point: | |
| Density: | Storage Condition: | room temperature |
Product Description:
This chemical is primarily used as a photoacid generator (PAG) in various photolithography processes, especially in the manufacturing of semiconductors and microelectronics. When exposed to ultraviolet (UV) light, it releases strong acids that catalyze the cross-linking or deprotection of polymers, enabling precise patterning on silicon wafers. Its efficiency and stability make it suitable for advanced photoresist formulations, contributing to the production of high-resolution electronic components. Additionally, it finds application in the development of advanced materials and coatings where controlled acid generation is required for curing or modification processes.
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.250 | 10-20 days | ฿5,373.00 |
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(4-Iodophenyl)diphenylsulfonium triflate
This chemical is primarily used as a photoacid generator (PAG) in various photolithography processes, especially in the manufacturing of semiconductors and microelectronics. When exposed to ultraviolet (UV) light, it releases strong acids that catalyze the cross-linking or deprotection of polymers, enabling precise patterning on silicon wafers. Its efficiency and stability make it suitable for advanced photoresist formulations, contributing to the production of high-resolution electronic components. Additionally, it finds application in the development of advanced materials and coatings where controlled acid generation is required for curing or modification processes.
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