Tris(hexafluoroacetylacetonato)iron(III)
≥95%(T)
- Product Code: 82711
CAS:
17786-67-3
| Molecular Weight: | 677.00 g./mol | Molecular Formula: | C₁₅H₃F₁₈FeO₆ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00059457 | |
| Melting Point: | 52°C | Boiling Point: | |
| Density: | Storage Condition: | room temperature, dry |
Product Description:
Used as a precursor in chemical vapor deposition (CVD) processes to produce thin films of iron oxide, which are essential in the fabrication of magnetic storage devices and sensors. It also serves as a catalyst in organic synthesis, particularly in oxidation reactions, due to its stability and efficiency. Additionally, it is employed in the development of advanced materials for electronics and optics, where precise control over film composition and structure is required. Its high volatility and thermal stability make it suitable for applications in nanotechnology and microelectronics.
Product Specification:
| Test | Specification |
|---|---|
| APPEARANCE | Orange to Amber to Dark red powder to crystal |
| PURITY | 94.5-100 |
| Infrared spectrum | Conforms to Structure |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 0.250 | 10-20 days | ฿6,320.00 |
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| 1.000 | 10-20 days | ฿14,580.00 |
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Tris(hexafluoroacetylacetonato)iron(III)
Used as a precursor in chemical vapor deposition (CVD) processes to produce thin films of iron oxide, which are essential in the fabrication of magnetic storage devices and sensors. It also serves as a catalyst in organic synthesis, particularly in oxidation reactions, due to its stability and efficiency. Additionally, it is employed in the development of advanced materials for electronics and optics, where precise control over film composition and structure is required. Its high volatility and thermal stability make it suitable for applications in nanotechnology and microelectronics.
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