2,2,4,4,6,6-Hexamethylcyclotrisilazane
≥95.0%(GC)
- Product Code: 88167
Alias:
1,1,3,3,5,5-Hexamethylcyclotrisilazane; 2,2,4,4,6,6-Hexamethylcyclotrisilazane; 1,1,3,3, 5,5-Hexamethylcyclotrisilazane;
CAS:
1009-93-4
| Molecular Weight: | 219.51 g./mol | Molecular Formula: | C₆H₂₁N₃Si₃ |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00039698 | |
| Melting Point: | −10 °C(lit.) | Boiling Point: | 188 °C |
| Density: | 0.92 g/mL3 | Storage Condition: | 2~8℃, inert gas protection |
Product Description:
This chemical is primarily used in the production of silicon nitride films, which are crucial in semiconductor manufacturing. It serves as a precursor in chemical vapor deposition (CVD) processes to create thin, high-quality silicon nitride layers on substrates. These layers are essential for insulating and protecting electronic components in integrated circuits. Additionally, it finds application in the synthesis of organosilicon compounds, which are utilized in various industrial and research settings. Its role in forming protective coatings also extends to enhancing the durability and performance of materials in harsh environments.
Product Specification:
| Test | Specification |
|---|---|
| PurityGC | 90 100% |
| PURITYTECH | 95-100 |
| Appearance | COLORLESS LIQUID |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 5.000 | 10-20 days | $56.06 |
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2,2,4,4,6,6-Hexamethylcyclotrisilazane
This chemical is primarily used in the production of silicon nitride films, which are crucial in semiconductor manufacturing. It serves as a precursor in chemical vapor deposition (CVD) processes to create thin, high-quality silicon nitride layers on substrates. These layers are essential for insulating and protecting electronic components in integrated circuits. Additionally, it finds application in the synthesis of organosilicon compounds, which are utilized in various industrial and research settings. Its role in forming protective coatings also extends to enhancing the durability and performance of materials in harsh environments.
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