Tantalum(V) chloride
99.8% trace metals basis
- Product Code: 240072
Alias:
Tantalum pentachloride
CAS:
7721-01-9
| Molecular Weight: | 358.21 g./mol | Molecular Formula: | TaCl₅ |
|---|---|---|---|
| EC Number: | 231-755-6 | MDL Number: | MFCD00011253 |
| Melting Point: | 221 °C | Boiling Point: | |
| Density: | 3.68 g/mL at 25 °C(lit.) | Storage Condition: | Room temperature, seal, dry, inert gas storage |
Product Description:
Used primarily in the semiconductor industry as a precursor for chemical vapor deposition (CVD) of tantalum-containing films, especially tantalum nitride and tantalum carbide, which serve as diffusion barriers and conductive layers in integrated circuits. Also employed in research for synthesizing other tantalum-based compounds and catalysts. Its high reactivity with moisture limits handling but makes it effective in vapor-phase reactions for producing high-purity, high-performance coatings in microelectronics and hard coating applications.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 25g | 10-20 days | £164.17 |
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| 100g | 10-20 days | £654.42 |
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| 5g | 10-20 days | £44.46 |
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Tantalum(V) chloride
Used primarily in the semiconductor industry as a precursor for chemical vapor deposition (CVD) of tantalum-containing films, especially tantalum nitride and tantalum carbide, which serve as diffusion barriers and conductive layers in integrated circuits. Also employed in research for synthesizing other tantalum-based compounds and catalysts. Its high reactivity with moisture limits handling but makes it effective in vapor-phase reactions for producing high-purity, high-performance coatings in microelectronics and hard coating applications.
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