Tantalum(V) chloride
99.99% trace metals basis
- Product Code: 240073
CAS:
7721-01-9
| Molecular Weight: | 358.21 g./mol | Molecular Formula: | TaCl₅ |
|---|---|---|---|
| EC Number: | 231-755-6 | MDL Number: | MFCD00011253 |
| Melting Point: | 221 °C | Boiling Point: | 242 °C |
| Density: | 3.68 g/mL at 25 °C(lit.) | Storage Condition: | Room temperature, seal, dry, inert gas storage |
Product Description:
Used primarily in the semiconductor industry as a precursor for chemical vapor deposition (CVD) of tantalum-containing thin films. These films serve as diffusion barriers and conductive layers in advanced microelectronic devices, especially in integrated circuits. Also employed in the synthesis of other tantalum-based compounds and catalysts. Its high reactivity makes it suitable for research applications involving metal-organic frameworks and specialty ceramics. Requires careful handling due to moisture sensitivity and corrosive byproducts.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 1g | 10-20 days | ฿800.00 |
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| 5g | 10-20 days | ฿3,260.00 |
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| 25g | 10-20 days | ฿9,850.00 |
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| 100g | 10-20 days | ฿33,560.00 |
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| 500g | 10-20 days | ฿134,470.00 |
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Tantalum(V) chloride
Used primarily in the semiconductor industry as a precursor for chemical vapor deposition (CVD) of tantalum-containing thin films. These films serve as diffusion barriers and conductive layers in advanced microelectronic devices, especially in integrated circuits. Also employed in the synthesis of other tantalum-based compounds and catalysts. Its high reactivity makes it suitable for research applications involving metal-organic frameworks and specialty ceramics. Requires careful handling due to moisture sensitivity and corrosive byproducts.
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