5-Vinylbicyclo[2.2.1]hept-2-ene

98%

Reagent Code: #245391
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CAS Number 3048-64-4

science Other reagents with same CAS 3048-64-4

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 120.2 g/mol
Formula C₉H₁₂
badge Registry Numbers
MDL Number MFCD00080691
thermostat Physical Properties
Boiling Point 141°C
inventory_2 Storage & Handling
Density 0.89g/mL
Storage Room temperature, dry

description Product Description

Used primarily as a monomer in the synthesis of specialty polymers and copolymers, particularly in ring-opening metathesis polymerization (ROMP) processes. Its unique bridged bicyclic structure with a reactive vinyl group enables the production of polymers with high thermal stability and tailored mechanical properties. Commonly employed in advanced materials for microelectronics, such as low-dielectric-constant insulators, and in the development of functional coatings and photoresists. Also finds use in crosslinking agents for resins and in the preparation of norbornene-based copolymers for optical and semiconductor applications.

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Size Availability Unit Price Quantity
inventory 100ml
10-20 days ฿3,480.00
inventory 25ml
10-20 days ฿1,050.00
inventory 5mL
10-20 days ฿450.00

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5-Vinylbicyclo[2.2.1]hept-2-ene
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Used primarily as a monomer in the synthesis of specialty polymers and copolymers, particularly in ring-opening metathesis polymerization (ROMP) processes. Its unique bridged bicyclic structure with a reactive vinyl group enables the production of polymers with high thermal stability and tailored mechanical properties. Commonly employed in advanced materials for microelectronics, such as low-dielectric-constant insulators, and in the development of functional coatings and photoresists. Also finds use in

Used primarily as a monomer in the synthesis of specialty polymers and copolymers, particularly in ring-opening metathesis polymerization (ROMP) processes. Its unique bridged bicyclic structure with a reactive vinyl group enables the production of polymers with high thermal stability and tailored mechanical properties. Commonly employed in advanced materials for microelectronics, such as low-dielectric-constant insulators, and in the development of functional coatings and photoresists. Also finds use in crosslinking agents for resins and in the preparation of norbornene-based copolymers for optical and semiconductor applications.

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