Cobalt wire, 1.5mm diameter, annealing, 99.995% metals basis
1.5mm diameter, annealing, 99.995% metals basis
- Product Code: 248466
Alias:
Cobalt powder/cobalt sheets; ultrafine cobalt powder
CAS:
7440-48-4
| Molecular Weight: | 58.93 g./mol | Molecular Formula: | Co |
|---|---|---|---|
| EC Number: | 231-158-0 | MDL Number: | MFCD00010935 |
| Melting Point: | 1495°C | Boiling Point: | 2900 °C(lit.) |
| Density: | 1.03 g/mL at 25 °C | Storage Condition: | Room temperature |
Product Description:
Used as a high-purity electrical conductor in specialized electronic devices and sensors requiring stable performance at elevated temperatures. Commonly employed in thermocouples, especially type K (chromel-alumel), where cobalt wire serves as part of the sensing junction. Its high thermal and oxidation resistance makes it suitable for use in furnace components, high-temperature heating elements, and catalytic processes. Also used in research settings for crystal growth, magnetic material studies, and thin-film deposition techniques such as chemical vapor deposition (CVD) or physical vapor deposition (PVD). The annealed form ensures improved ductility and workability for fine wiring and precision applications in laboratory and semiconductor industries.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 2cm | 10-20 days | ฿6,450.00 |
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Cobalt wire, 1.5mm diameter, annealing, 99.995% metals basis
Used as a high-purity electrical conductor in specialized electronic devices and sensors requiring stable performance at elevated temperatures. Commonly employed in thermocouples, especially type K (chromel-alumel), where cobalt wire serves as part of the sensing junction. Its high thermal and oxidation resistance makes it suitable for use in furnace components, high-temperature heating elements, and catalytic processes. Also used in research settings for crystal growth, magnetic material studies, and thin-film deposition techniques such as chemical vapor deposition (CVD) or physical vapor deposition (PVD). The annealed form ensures improved ductility and workability for fine wiring and precision applications in laboratory and semiconductor industries.
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