Cobalt wire, 1.5mm diameter, annealing, 99.995% metals basis

1.5mm diameter, annealing, 99.995% metals basis

Reagent Code: #248466
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Alias Cobalt powder/cobalt sheets; ultrafine cobalt powder
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CAS Number 7440-48-4

science Other reagents with same CAS 7440-48-4

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 58.93 g/mol
Formula Co
badge Registry Numbers
EC Number 231-158-0
MDL Number MFCD00010935
thermostat Physical Properties
Melting Point 1495°C
Boiling Point 2900 °C(lit.)
inventory_2 Storage & Handling
Density 1.03 g/mL at 25 °C
Storage Room temperature

description Product Description

Used as a high-purity electrical conductor in specialized electronic devices and sensors requiring stable performance at elevated temperatures. Commonly employed in thermocouples, especially type K (chromel-alumel), where cobalt wire serves as part of the sensing junction. Its high thermal and oxidation resistance makes it suitable for use in furnace components, high-temperature heating elements, and catalytic processes. Also used in research settings for crystal growth, magnetic material studies, and thin-film deposition techniques such as chemical vapor deposition (CVD) or physical vapor deposition (PVD). The annealed form ensures improved ductility and workability for fine wiring and precision applications in laboratory and semiconductor industries.

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inventory 2cm
10-20 days ฿6,450.00

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Cobalt wire, 1.5mm diameter, annealing, 99.995% metals basis
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Used as a high-purity electrical conductor in specialized electronic devices and sensors requiring stable performance at elevated temperatures. Commonly employed in thermocouples, especially type K (chromel-alumel), where cobalt wire serves as part of the sensing junction. Its high thermal and oxidation resistance makes it suitable for use in furnace components, high-temperature heating elements, and catalytic processes. Also used in research settings for crystal growth, magnetic material studies, and thin-film deposition techniques such as chemical vapor deposition (CVD) or physical vapor deposition (PVD). The annealed form ensures improved ductility and workability for fine wiring and precision applications in laboratory and semiconductor industries.
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