2,2,6,6-Tetramethylpiperidine
99%
- Product Code: 238112
CAS:
768-66-1
Molecular Weight: | 141.25 g./mol | Molecular Formula: | C₉H₁₉N |
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EC Number: | MDL Number: | MFCD00005985 | |
Melting Point: | -59 °C | Boiling Point: | 152 °C |
Density: | 0.837 g/mL | Storage Condition: | Room temperature |
Product Description:
Used primarily as a precursor in the synthesis of hindered amine light stabilizers (HALS), this compound plays a critical role in protecting polymers and coatings from degradation caused by ultraviolet (UV) light. Its derivatives help prevent photo-oxidative damage in plastics, paints, and adhesives, significantly extending the lifespan of outdoor materials such as polyolefins, automotive finishes, and agricultural films. Due to its stable amine structure, it effectively scavenges free radicals formed under UV exposure, reducing cracking, fading, and loss of mechanical strength. It is also employed in organic synthesis as a building block for specialty amines and nitroxyl radicals used in catalysis and analytical chemistry.
Sizes / Availability / Pricing:
Size | Availability | Price | Quantity |
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5ml | 10-20 days | ฿440.00 |
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25ml | 10-20 days | ฿630.00 |
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100ml | 10-20 days | ฿1,580.00 |
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500ml | 10-20 days | ฿6,900.00 |
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2,2,6,6-Tetramethylpiperidine
Used primarily as a precursor in the synthesis of hindered amine light stabilizers (HALS), this compound plays a critical role in protecting polymers and coatings from degradation caused by ultraviolet (UV) light. Its derivatives help prevent photo-oxidative damage in plastics, paints, and adhesives, significantly extending the lifespan of outdoor materials such as polyolefins, automotive finishes, and agricultural films. Due to its stable amine structure, it effectively scavenges free radicals formed under UV exposure, reducing cracking, fading, and loss of mechanical strength. It is also employed in organic synthesis as a building block for specialty amines and nitroxyl radicals used in catalysis and analytical chemistry.
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