Tetramethylammonium hydroxide solution
Ultrapure grade, 25% aqueous solution, for trace analysis
- Product Code: 238769
Alias:
25% solution of tetramethylammonium hydroxide; developer TMAH
CAS:
75-59-2
| Molecular Weight: | 91.15 g./mol | Molecular Formula: | C₄H₁₃NO |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00008280 | |
| Melting Point: | Boiling Point: | ||
| Density: | 1.016 g/mL at 25 °C | Storage Condition: | Room temperature |
Product Description:
Used as a developer in photolithography processes, especially in semiconductor manufacturing, where it selectively removes exposed regions of photoresist with high precision. Commonly employed in microfabrication for etching and patterning due to its consistent performance and compatibility with silicon-based materials. Also utilized in organic synthesis as a strong base for deprotonation and elimination reactions. Its aqueous solution serves in analytical chemistry for sample preparation and as a phase-transfer catalyst in various chemical transformations.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 250ml | 10-20 days | £97.74 |
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| 1L | 10-20 days | £263.77 |
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| 5L | 10-20 days | £786.28 |
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Tetramethylammonium hydroxide solution
Used as a developer in photolithography processes, especially in semiconductor manufacturing, where it selectively removes exposed regions of photoresist with high precision. Commonly employed in microfabrication for etching and patterning due to its consistent performance and compatibility with silicon-based materials. Also utilized in organic synthesis as a strong base for deprotonation and elimination reactions. Its aqueous solution serves in analytical chemistry for sample preparation and as a phase-transfer catalyst in various chemical transformations.
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