Tetramethylammonium hydroxide solution
10% in MeOH
- Product Code: 78407
Alias:
Tetramethylammonium hydroxide 25% solution; developer TMAH
CAS:
75-59-2
| Molecular Weight: | 91.15 g./mol | Molecular Formula: | C₄H₁₃NO |
|---|---|---|---|
| EC Number: | MDL Number: | MFCD00008280 | |
| Melting Point: | °C | Boiling Point: | 110 °C |
| Density: | Storage Condition: | room temperature |
Product Description:
Used primarily in the electronics industry as a developer for photoresists in the production of semiconductors and printed circuit boards. It effectively removes exposed areas of photoresist, allowing for precise pattern creation. Additionally, it serves as a catalyst in organic synthesis, particularly in the production of silicone polymers and other specialty chemicals. In analytical chemistry, it is employed as a reagent for titrations and as an ion-pairing agent in chromatography to improve separation efficiency. Its strong alkaline properties also make it useful in cleaning and etching applications for various surfaces.
Product Specification:
| Test | Specification |
|---|---|
| CONCENTRATION NT | 8-12 |
| Water by KF | 0-15 |
| APPEARANCE | COLORLESS LIQUID |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 25.000 | 10-20 days | ฿370.00 |
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| 100.000 | 10-20 days | ฿880.00 |
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| 500.000 | 10-20 days | ฿3,860.00 |
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| 2500.000 | 10-20 days | ฿16,380.00 |
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Tetramethylammonium hydroxide solution
Used primarily in the electronics industry as a developer for photoresists in the production of semiconductors and printed circuit boards. It effectively removes exposed areas of photoresist, allowing for precise pattern creation. Additionally, it serves as a catalyst in organic synthesis, particularly in the production of silicone polymers and other specialty chemicals. In analytical chemistry, it is employed as a reagent for titrations and as an ion-pairing agent in chromatography to improve separation efficiency. Its strong alkaline properties also make it useful in cleaning and etching applications for various surfaces.
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