Tetramethylsilane
99%
- Product Code: 88570
Alias:
Tetramethylsilane, TMS
CAS:
75-76-3
| Molecular Weight: | 88.22 g./mol | Molecular Formula: | C₄H₁₂Si |
|---|---|---|---|
| EC Number: | 200-899-1 | MDL Number: | MFCD00008274 |
| Melting Point: | -27 °C | Boiling Point: | 26-28 °C(lit.) |
| Density: | 0.648 g/mL at 25 °C(lit.) | Storage Condition: | 2~8°C |
Product Description:
Tetramethylsilane is widely used as a reference standard in nuclear magnetic resonance (NMR) spectroscopy. Its single sharp peak serves as a calibration point for chemical shift measurements, ensuring accuracy in analyzing molecular structures. Additionally, it is employed as a solvent in various chemical reactions due to its inert nature and low boiling point. In the semiconductor industry, it acts as a precursor in the production of silicon-based materials and thin films. Its volatility and stability make it suitable for use in gas chromatography as a non-reactive carrier gas. Furthermore, it is utilized in the synthesis of organosilicon compounds, which are essential in the development of silicones and other industrial materials.
Product Specification:
| Test | Specification |
|---|---|
| PurityGC | 99 100% |
| REFRACTIVE INDEX N20D | 1.3575-1.3595 |
| APPEARANCE | COLORLESS LIQUID |
| INFRARED SPECTRUM | Conforms to Structure |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 1.000 | 10-20 days | ฿390.00 |
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| 5.000 | 10-20 days | ฿1,360.00 |
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| 25.000 | 10-20 days | ฿5,130.00 |
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| 100.000 | 10-20 days | ฿20,360.00 |
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Tetramethylsilane
Tetramethylsilane is widely used as a reference standard in nuclear magnetic resonance (NMR) spectroscopy. Its single sharp peak serves as a calibration point for chemical shift measurements, ensuring accuracy in analyzing molecular structures. Additionally, it is employed as a solvent in various chemical reactions due to its inert nature and low boiling point. In the semiconductor industry, it acts as a precursor in the production of silicon-based materials and thin films. Its volatility and stability make it suitable for use in gas chromatography as a non-reactive carrier gas. Furthermore, it is utilized in the synthesis of organosilicon compounds, which are essential in the development of silicones and other industrial materials.
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