As solution

1000µg/ml,10% HNO3

Reagent Code: #138966

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inventory_2 Storage & Handling
Storage 2~8 ℃

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Used as a precursor in the synthesis of gallium arsenide (GaAs), a semiconductor material widely applied in high-speed electronics, infrared light-emitting diodes (LEDs), laser diodes, and photovoltaic cells. Also employed in doping silicon for n-type semiconductors and in the production of compound semiconductors for microwave frequency devices and optoelectronic components. Its role in metalorganic vapor phase epitaxy (MOVPE) enables precise layering of arsenic-containing films in advanced electronic and photonic devices.

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inventory 50ml
10-20 days ฿1,820.00

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As solution
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Used as a precursor in the synthesis of gallium arsenide (GaAs), a semiconductor material widely applied in high-speed electronics, infrared light-emitting diodes (LEDs), laser diodes, and photovoltaic cells. Also employed in doping silicon for n-type semiconductors and in the production of compound semiconductors for microwave frequency devices and optoelectronic components. Its role in metalorganic vapor phase epitaxy (MOVPE) enables precise layering of arsenic-containing films in advanced electronic and photonic devices.
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