As solution

100µg/ml,5% HNO3

Reagent Code: #93490

blur_circular Chemical Specifications

inventory_2 Storage & Handling
Storage 2~8 ℃

description Product Description

This solution is widely used in the semiconductor industry for doping silicon wafers to modify their electrical properties. It plays a crucial role in the production of integrated circuits and microelectronics by creating n-type semiconductors. Additionally, it is utilized in the manufacturing of optoelectronic devices, such as LEDs and laser diodes, to enhance their performance. In metallurgy, it is employed as an alloying agent to improve the strength and corrosion resistance of certain metals. It also finds application in research laboratories for synthesizing various arsenic-containing compounds and studying their properties.

format_list_bulleted Product Specification

Test Parameter Specification
Appearance Liquid
Concentration 98-102

Available Sizes & Pricing

Size Availability Unit Price Quantity
50ml
10-20 days ฿1,790.00
100ml
10-20 days ฿3,360.00
500ml
10-20 days ฿16,200.00
As solution
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This solution is widely used in the semiconductor industry for doping silicon wafers to modify their electrical properties. It plays a crucial role in the production of integrated circuits and microelectronics by creating n-type semiconductors. Additionally, it is utilized in the manufacturing of optoelectronic devices, such as LEDs and laser diodes, to enhance their performance. In metallurgy, it is employed as an alloying agent to improve the strength and corrosion resistance of certain metals. It also finds application in research laboratories for synthesizing various arsenic-containing compounds and studying their properties.
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