3,5-Bis(trifluoromethyl)benzamide
98.0 %
Reagent
Code: #117327
Alias
3,5-bis(trifluoromethyl)benzamide;
3,5-Bistrifluoromethylbenzamide
CAS Number
22227-26-5
blur_circular Chemical Specifications
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Molecular Information
Weight
257.13 g/mol
Formula
C₉H₅F₆NO
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Registry Numbers
EC Number
244-849-7
MDL Number
MFCD00015511
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Physical Properties
Melting Point
163-167 °C(lit.)
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Storage & Handling
Storage
room temperature
description Product Description
Used primarily in organic synthesis as a building block for more complex molecules, particularly in the pharmaceutical industry. It serves as an intermediate in the development of drugs, especially those targeting central nervous system disorders. The trifluoromethyl groups enhance the compound's stability and bioavailability, making it valuable in creating potent and selective therapeutic agents. Additionally, it is employed in agrochemical research for designing advanced crop protection products. Its unique structure also finds applications in material science, particularly in the development of specialty polymers and coatings with enhanced chemical resistance.
format_list_bulleted Product Specification
Test Parameter | Specification |
---|---|
Melting Point | 162-167 |
Purity (GC) | 98-100 |
Appearance | White To Tan Powder, Crystals And/Or Chunks |
Infrared Spectrometry | Conforms To Structure |
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3,5-Bis(trifluoromethyl)benzamide
Used primarily in organic synthesis as a building block for more complex molecules, particularly in the pharmaceutical industry. It serves as an intermediate in the development of drugs, especially those targeting central nervous system disorders. The trifluoromethyl groups enhance the compound's stability and bioavailability, making it valuable in creating potent and selective therapeutic agents. Additionally, it is employed in agrochemical research for designing advanced crop protection products. Its unique structure also finds applications in material science, particularly in the development of specialty polymers and coatings with enhanced chemical resistance.
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