Hexamethyl disilylamine (HMDS)
AR,98%
- Product Code: 87982
Alias:
Hexamethyldisilazane; Hexamethyldisilazane, Hexamethyldisilazane
CAS:
999-97-3
Molecular Weight: | 161.39 g./mol | Molecular Formula: | C₆H₁₉NSi₂ |
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EC Number: | 213-668-5 | MDL Number: | MFCD00008259 |
Melting Point: | -78 °C | Boiling Point: | 125 °C(lit.) |
Density: | 0.774 g/mL at 25 °C(lit.) | Storage Condition: | Room temperature, cool, filled with argon |
Product Description:
Hexamethyl disilylamine (HMDS) is widely used in the semiconductor industry as a priming agent for photoresist adhesion. It is applied to silicon wafers to create a hydrophobic surface, which improves the uniformity and adhesion of photoresists during lithography processes. This ensures precise patterning in microchip manufacturing. HMDS is also utilized in organic synthesis as a silylating agent, protecting reactive functional groups like hydroxyl and amine during chemical reactions. Additionally, it serves as a precursor in the production of silicon-based materials, including silicon nitride and silicon carbide, which are essential in advanced ceramics and electronics. Its volatility and reactivity make it a valuable chemical in both industrial and laboratory settings.
Product Specification:
Test | Specification |
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PURITY | 98-100 |
REFRACTIVE INDEX 20C | 1.4069-1.4089 |
APPEARANCE | COLORLESS LIQUID |
Sizes / Availability / Pricing:
Size (g) | Availability | Price | Quantity |
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25.000 | 10-20 days | ฿310.00 |
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100.000 | 10-20 days | ฿590.00 |
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250.000 | 10-20 days | ฿1,380.00 |
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500.000 | 10-20 days | ฿2,750.00 |
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2500.000 | 10-20 days | ฿9,680.00 |
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Hexamethyl disilylamine (HMDS)
Hexamethyl disilylamine (HMDS) is widely used in the semiconductor industry as a priming agent for photoresist adhesion. It is applied to silicon wafers to create a hydrophobic surface, which improves the uniformity and adhesion of photoresists during lithography processes. This ensures precise patterning in microchip manufacturing. HMDS is also utilized in organic synthesis as a silylating agent, protecting reactive functional groups like hydroxyl and amine during chemical reactions. Additionally, it serves as a precursor in the production of silicon-based materials, including silicon nitride and silicon carbide, which are essential in advanced ceramics and electronics. Its volatility and reactivity make it a valuable chemical in both industrial and laboratory settings.
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