cyclohexane-1,2-diyldimethanediyl dimethanesulfonate

≥95%

Reagent Code: #157217
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CAS Number 66347-68-0

science Other reagents with same CAS 66347-68-0

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 300.3922 g/mol
Formula C₁₀H₂₀O₆S₂
thermostat Physical Properties
Melting Point 73-75 °C
Boiling Point 495.3±18.0 °C(Predicted)
inventory_2 Storage & Handling
Density 1.270±0.06 g/cm3(Predicted)
Storage 2-8°C

description Product Description

Used primarily as a crosslinking agent in polymer chemistry, this compound enables the formation of thermally stable and mechanically robust networks in specialty resins. It is particularly effective in cationic polymerization processes, where it contributes to the development of high-performance coatings and encapsulants. Its bifunctional sulfonate ester structure allows for efficient linking of reactive monomers, enhancing the glass transition temperature and chemical resistance of the resulting polymers. It finds niche use in electronic materials, such as in photoresists and dielectric layers, due to its ability to support fine patterning and thermal stability during semiconductor processing. Additionally, it serves as a building block in the synthesis of advanced organic frameworks where controlled molecular architecture is required.

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Size Availability Unit Price Quantity
inventory 100mg
10-20 days ฿48,000.00
inventory 250mg
10-20 days ฿80,000.00

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cyclohexane-1,2-diyldimethanediyl dimethanesulfonate
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Used primarily as a crosslinking agent in polymer chemistry, this compound enables the formation of thermally stable and mechanically robust networks in specialty resins. It is particularly effective in cationic polymerization processes, where it contributes to the development of high-performance coatings and encapsulants. Its bifunctional sulfonate ester structure allows for efficient linking of reactive monomers, enhancing the glass transition temperature and chemical resistance of the resulting polyme

Used primarily as a crosslinking agent in polymer chemistry, this compound enables the formation of thermally stable and mechanically robust networks in specialty resins. It is particularly effective in cationic polymerization processes, where it contributes to the development of high-performance coatings and encapsulants. Its bifunctional sulfonate ester structure allows for efficient linking of reactive monomers, enhancing the glass transition temperature and chemical resistance of the resulting polymers. It finds niche use in electronic materials, such as in photoresists and dielectric layers, due to its ability to support fine patterning and thermal stability during semiconductor processing. Additionally, it serves as a building block in the synthesis of advanced organic frameworks where controlled molecular architecture is required.

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