Gallium acetylacetonate
99.99% metals basis
Reagent
Code: #93755
CAS Number
14405-43-7
blur_circular Chemical Specifications
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Molecular Information
Weight
367.05 g/mol
Formula
C₁₅H₂₁O₆Ga
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Registry Numbers
EC Number
238-377-0
MDL Number
MFCD00013492
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Physical Properties
Melting Point
196-198 °C (dec.)(lit.)
Boiling Point
140°C 10mm
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Storage & Handling
Density
1.42 g/cm3
Storage
room temperature
description Product Description
Gallium acetylacetonate is primarily used in the field of materials science and nanotechnology. It serves as a precursor in the synthesis of gallium oxide thin films, which are essential in the production of semiconductors and optoelectronic devices. These thin films are employed in applications such as gas sensors, transparent conductive oxides, and dielectric layers in electronic components. Additionally, it is utilized in the preparation of gallium-containing nanoparticles, which have potential uses in catalysis, biomedical imaging, and targeted drug delivery systems. The compound is also explored in chemical vapor deposition (CVD) processes to create high-purity gallium-based materials for advanced technological applications.
format_list_bulleted Product Specification
Test Parameter | Specification |
---|---|
GA Complexometric Titration | 18.1-20 |
Impurities | 99.99-100% |
Total Metallic Impurities | 0-200 ppm |
Appearance | White to pale yellow powder or crystals |
ICP | Confirms gallium component |
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Gallium acetylacetonate
Gallium acetylacetonate is primarily used in the field of materials science and nanotechnology. It serves as a precursor in the synthesis of gallium oxide thin films, which are essential in the production of semiconductors and optoelectronic devices. These thin films are employed in applications such as gas sensors, transparent conductive oxides, and dielectric layers in electronic components. Additionally, it is utilized in the preparation of gallium-containing nanoparticles, which have potential uses in catalysis, biomedical imaging, and targeted drug delivery systems. The compound is also explored in chemical vapor deposition (CVD) processes to create high-purity gallium-based materials for advanced technological applications.
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