Used primarily in the electronics industry as a precursor for germanium-containing thin films and coatings. It serves in chemical vapor deposition (CVD) processes to fabricate semiconductor materials, where controlled germanium doping is required. Also employed in specialized catalysts and in the synthesis of fluoride-based glasses with infrared transmission properties. Its role as a source of germanium and fluoride ions makes it useful in research settings for developing new inorganic materials and optoelectronic components.