This compound is a specialty chemical primarily used as a photoacid generator (PAG) in advanced lithography for semiconductor manufacturing and electronics. It plays a crucial role in chemically amplified photoresists, where exposure to light or radiation generates triflic acid, catalyzing deprotection reactions to enable high-resolution patterning of microelectronic circuits. This makes it essential for producing integrated circuits, flexible displays, OLEDs, and photovoltaic cells. Its fluorinated structure enhances photosensitivity, thermal stability, and efficiency in charge transport materials, supporting innovations in optoelectronics and energy-efficient technologies. Additionally, it is employed in research for developing novel resists and materials with tailored electronic properties.