This chemical is widely used in the production of advanced polymers and resins due to its unique bicyclic structure and functional groups. It serves as a key monomer in the synthesis of high-performance materials, particularly in the development of photoresists for semiconductor manufacturing. Its ability to form stable and precise patterns makes it essential in the fabrication of microelectronic devices. Additionally, it is employed in the creation of specialty coatings and adhesives, offering enhanced durability and chemical resistance. The compound is also utilized in research for designing novel organic frameworks and catalysts, contributing to advancements in material science and chemical engineering.