Used as a precursor in the synthesis of germanium-containing organic materials, particularly in semiconductor and optoelectronic applications. It serves in the deposition of germanium-based thin films via chemical vapor deposition (CVD), enabling the fabrication of advanced electronic devices. Its reactivity and structure make it suitable for incorporation into hybrid organic-inorganic polymers and functional materials where controlled germanium bonding is required. Also explored in the development of specialty catalysts and as a reagent in organogermanium chemistry for research purposes.