Triosmium dodecacarbonyl

98%

Reagent Code: #242495
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CAS Number 15696-40-9

science Other reagents with same CAS 15696-40-9

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 906.810 g/mol
Formula C₁₂O₁₂Os₃
badge Registry Numbers
MDL Number MFCD00011149
thermostat Physical Properties
Melting Point 224 °C (lit.)
inventory_2 Storage & Handling
Storage Room temperature

description Product Description

Used as a precursor in organometallic synthesis, particularly in the preparation of other osmium carbonyl complexes and clusters. Serves as a catalyst or catalyst precursor in certain organic transformations, including hydrogenation and carbonylation reactions. Employed in research settings for studying metal-metal bonding and cluster chemistry due to its stable, well-defined structure. Also utilized in the deposition of osmium-containing thin films for specialized materials applications.

shopping_cart Available Sizes & Pricing

Size Availability Unit Price Quantity
inventory 25mg
10-20 days ฿5,400.00
inventory 100mg
10-20 days ฿14,990.00
inventory 250mg
10-20 days ฿36,660.00

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Triosmium dodecacarbonyl
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Used as a precursor in organometallic synthesis, particularly in the preparation of other osmium carbonyl complexes and clusters. Serves as a catalyst or catalyst precursor in certain organic transformations, including hydrogenation and carbonylation reactions. Employed in research settings for studying metal-metal bonding and cluster chemistry due to its stable, well-defined structure. Also utilized in the deposition of osmium-containing thin films for specialized materials applications.

Used as a precursor in organometallic synthesis, particularly in the preparation of other osmium carbonyl complexes and clusters. Serves as a catalyst or catalyst precursor in certain organic transformations, including hydrogenation and carbonylation reactions. Employed in research settings for studying metal-metal bonding and cluster chemistry due to its stable, well-defined structure. Also utilized in the deposition of osmium-containing thin films for specialized materials applications.

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