Used as a key intermediate in the synthesis of high-performance polymers, particularly in the production of fluorinated polyimides. These polyimides exhibit exceptional thermal stability, low dielectric constants, and excellent chemical resistance, making them suitable for advanced microelectronics, such as insulating layers in semiconductor devices and flexible printed circuits. The compound’s fluorinated structure contributes to improved solubility and processability of the resulting polymers, enabling easier fabrication of thin films. It is also employed in specialty coatings for aerospace and defense applications where durability under extreme conditions is required.