Potassium hydrogen fluoride
98.0%
- Product Code: 224661
Alias:
Potassium hydrofluoride; Potassium hydrogen fluoride, acid potassium fluoride, potassium difluoride
CAS:
7789-29-9
| Molecular Weight: | 78.10 g./mol | Molecular Formula: | KHF₂ |
|---|---|---|---|
| EC Number: | 232-156-2 | MDL Number: | MFCD00011403 |
| Melting Point: | 239 °C(lit.) | Boiling Point: | |
| Density: | 2.37 g/mL at 25 °C(lit.) | Storage Condition: | Room temperature, dry, sealed |
Product Description:
Used in the production of fluorine gas through electrolysis, where it serves as a key component in the electrolyte mixture due to its ability to conduct electricity and release fluorine at the anode.
Employed in metal surface treatment processes, especially for cleaning and etching aluminum and magnesium alloys, improving adhesion and corrosion resistance prior to painting or coating.
Acts as a catalyst or reagent in organic synthesis, particularly in fluorination reactions where controlled introduction of fluorine atoms into molecules is required.
Utilized in the preparation of other fluoride salts and in the refining of uranium and thorium compounds for nuclear applications, where it helps in the conversion of metal oxides to fluorides.
Commonly found in glass etching formulations, where it reacts with silica to create frosted or matte finishes on glass surfaces for decorative or industrial purposes.
Sizes / Availability / Pricing:
| Size | Availability | Price | Quantity |
|---|---|---|---|
| 500.000 G | 10-20 days | ฿500.00 |
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-
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| 2500.000 G | 10-20 days | ฿2,040.00 |
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|
Potassium hydrogen fluoride
Used in the production of fluorine gas through electrolysis, where it serves as a key component in the electrolyte mixture due to its ability to conduct electricity and release fluorine at the anode.
Employed in metal surface treatment processes, especially for cleaning and etching aluminum and magnesium alloys, improving adhesion and corrosion resistance prior to painting or coating.
Acts as a catalyst or reagent in organic synthesis, particularly in fluorination reactions where controlled introduction of fluorine atoms into molecules is required.
Utilized in the preparation of other fluoride salts and in the refining of uranium and thorium compounds for nuclear applications, where it helps in the conversion of metal oxides to fluorides.
Commonly found in glass etching formulations, where it reacts with silica to create frosted or matte finishes on glass surfaces for decorative or industrial purposes.
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