Ammonium fluoride
AR,98%
- Product Code: 73087
Alias:
Ammonium fluoride
CAS:
12125-01-8
| Molecular Weight: | 37.04 g./mol | Molecular Formula: | NH₄F |
|---|---|---|---|
| EC Number: | 235-185-9 | MDL Number: | MFCD00011423 |
| Melting Point: | 98°C | Boiling Point: | 65°C/760mmHg |
| Density: | 1.11 g/mL at 20 °C | Storage Condition: | room temperature |
Product Description:
Ammonium fluoride is widely used in the glass etching industry due to its ability to create frosted or matte finishes on glass surfaces. It is also employed in the production of ceramics to modify surface properties and enhance durability. In metallurgy, it serves as a flux to remove oxides from metal surfaces, improving the quality of welding and soldering. Additionally, it is utilized in the synthesis of other fluoride compounds and as a component in certain cleaning agents for removing rust and mineral deposits. In analytical chemistry, it acts as a buffering agent and is used in various laboratory processes. Its applications extend to the semiconductor industry, where it is used in the fabrication and cleaning of silicon wafers.
Product Specification:
| Test | Specification |
|---|---|
| ASSAY | 97.5-102.5 |
| FREE ACIDSNH4HF2 | 0-0.5 |
| HEAVY METALSPB | 0-0.001 |
| IRONFE | 0-0.002 |
| APPEARANCE | WHITE TO OFF-WHITE POWDER OR CRYSTALS |
Sizes / Availability / Pricing:
| Size (g) | Availability | Price | Quantity |
|---|---|---|---|
| 500.000 | 10-20 days | ฿690.00 |
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| 2500.000 | 10-20 days | ฿2,680.00 |
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| 10000.000 | 10-20 days | ฿8,980.00 |
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Ammonium fluoride
Ammonium fluoride is widely used in the glass etching industry due to its ability to create frosted or matte finishes on glass surfaces. It is also employed in the production of ceramics to modify surface properties and enhance durability. In metallurgy, it serves as a flux to remove oxides from metal surfaces, improving the quality of welding and soldering. Additionally, it is utilized in the synthesis of other fluoride compounds and as a component in certain cleaning agents for removing rust and mineral deposits. In analytical chemistry, it acts as a buffering agent and is used in various laboratory processes. Its applications extend to the semiconductor industry, where it is used in the fabrication and cleaning of silicon wafers.
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