Used as a gate electrode and interconnect material in semiconductor devices, particularly in advanced complementary metal-oxide-semiconductor (CMOS) technology paired with high-k dielectrics. It offers low electrical resistivity and high thermal stability, helping improve transistor performance, scalability, and reduce gate resistance. Also applied in microelectronics as a diffusion barrier and in high-temperature coatings due to its thermal stability and resistance to oxidation. Its refractory nature makes it suitable for components exposed to extreme heat, such as in aerospace and turbine applications.