MTX-211 is primarily used in advanced semiconductor manufacturing processes, specifically as a key component in extreme ultraviolet (EUV) photoresist formulations. It enables high-resolution patterning essential for producing sub-7nm node integrated circuits. Its unique molecular structure offers improved sensitivity and reduced line edge roughness, making it critical for next-generation chip fabrication. Additionally, MTX-211 contributes to enhanced etch resistance and pattern fidelity during plasma processing, supporting the development of high-performance logic and memory devices. Ongoing research explores its potential in directed self-assembly (DSA) lithography and quantum computing hardware fabrication.