Di-tert-Butylsilane

97%

Reagent Code: #88418
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CAS Number 30736-07-3

science Other reagents with same CAS 30736-07-3

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 144.33 g/mol
Formula C₈H₂₀Si
badge Registry Numbers
MDL Number MFCD00270996
thermostat Physical Properties
Melting Point -38°C (Lit.)
Boiling Point 129-130°C (Lit.)
inventory_2 Storage & Handling
Storage 2~8℃,Seal

description Product Description

Widely used as a reducing agent in organic synthesis, particularly for the reduction of carbonyl compounds to alcohols. It is also employed in the preparation of silicon-containing polymers and materials, where it acts as a precursor for introducing silicon into molecular structures. In the semiconductor industry, it serves as a source of silicon in chemical vapor deposition (CVD) processes for thin film production. Additionally, it is utilized in the synthesis of organosilicon compounds, which are important in the development of adhesives, coatings, and sealants. Its stability and reactivity make it a valuable reagent in various chemical transformations.

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inventory 1ml
10-20 days ฿2,520.00

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Di-tert-Butylsilane
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Widely used as a reducing agent in organic synthesis, particularly for the reduction of carbonyl compounds to alcohols. It is also employed in the preparation of silicon-containing polymers and materials, where it acts as a precursor for introducing silicon into molecular structures. In the semiconductor industry, it serves as a source of silicon in chemical vapor deposition (CVD) processes for thin film production. Additionally, it is utilized in the synthesis of organosilicon compounds, which are impor

Widely used as a reducing agent in organic synthesis, particularly for the reduction of carbonyl compounds to alcohols. It is also employed in the preparation of silicon-containing polymers and materials, where it acts as a precursor for introducing silicon into molecular structures. In the semiconductor industry, it serves as a source of silicon in chemical vapor deposition (CVD) processes for thin film production. Additionally, it is utilized in the synthesis of organosilicon compounds, which are important in the development of adhesives, coatings, and sealants. Its stability and reactivity make it a valuable reagent in various chemical transformations.

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