Used in the production of high-purity silica for optical fibers and semiconductor materials. Commonly employed in chemical vapor deposition (CVD) processes to form silicon dioxide layers on surfaces. Acts as a precursor in the manufacturing of fumed silica, which is used as a thickening agent in paints, coatings, and sealants. Also utilized in the synthesis of silane and other silicon-based compounds for industrial applications. Its reactivity with moisture makes it effective in smoke screens and fog generation for military or theatrical purposes.