Used in specialty polymer applications requiring high thermal stability and chemical resistance. Commonly employed in membrane technologies for gas separation due to its excellent permeability and selectivity properties. Also utilized in photoresists and lithography processes in the electronics industry because of its favorable patterning characteristics under UV exposure. Its hydrophobic nature makes it suitable for coatings and moisture-resistant films. Additionally, serves as a matrix material in controlled drug delivery systems and chromatographic supports owing to its tunable porosity and inertness.