Used primarily as a precursor in the synthesis of tungsten-containing compounds and catalysts. It serves in the preparation of tungsten-based thin films through chemical vapor deposition (CVD), which are applied in semiconductor manufacturing and electronic components. Also employed in research for developing new tungsten complexes with potential catalytic activity. Reacts readily with organic and inorganic ligands, making it valuable in organometallic chemistry and materials science. Due to its high reactivity with moisture, it is handled under inert conditions for controlled reactions.