1,1,1-Trifluoropropan-2-yl 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate

97%

Reagent Code: #238179
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CAS Number 118334-94-4

science Other reagents with same CAS 118334-94-4

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 396.15 g/mol
Formula C₇H₄O₃F₁₂S
inventory_2 Storage & Handling
Storage 2-8°C, sealed, dry

description Product Description

Used primarily as a fluorinated surfactant or surface-active agent in specialty applications requiring low surface tension and high chemical stability. Its unique fluorocarbon structure makes it effective in coatings, where it improves wetting, leveling, and anti-defect properties on difficult substrates. Commonly found in high-performance industrial formulations such as electronic coatings, precision cleaning agents, and photoresist materials due to its ability to enhance film uniformity and reduce defects. Also utilized as a processing aid in fluoropolymer manufacturing, where it helps control particle size and dispersion stability. Its thermal and hydrolytic resistance allows use in harsh environments where conventional surfactants degrade.

shopping_cart Available Sizes & Pricing

Size Availability Unit Price Quantity
inventory 100mg
10-20 days ฿11,610.00
inventory 1g
10-20 days ฿58,410.00
inventory 5g
10-20 days ฿210,210.00
1,1,1-Trifluoropropan-2-yl 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate
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Used primarily as a fluorinated surfactant or surface-active agent in specialty applications requiring low surface tension and high chemical stability. Its unique fluorocarbon structure makes it effective in coatings, where it improves wetting, leveling, and anti-defect properties on difficult substrates. Commonly found in high-performance industrial formulations such as electronic coatings, precision cleaning agents, and photoresist materials due to its ability to enhance film uniformity and reduce defe

Used primarily as a fluorinated surfactant or surface-active agent in specialty applications requiring low surface tension and high chemical stability. Its unique fluorocarbon structure makes it effective in coatings, where it improves wetting, leveling, and anti-defect properties on difficult substrates. Commonly found in high-performance industrial formulations such as electronic coatings, precision cleaning agents, and photoresist materials due to its ability to enhance film uniformity and reduce defects. Also utilized as a processing aid in fluoropolymer manufacturing, where it helps control particle size and dispersion stability. Its thermal and hydrolytic resistance allows use in harsh environments where conventional surfactants degrade.

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