Tungsten(VI) chloride

99.9% metals basis

Reagent Code: #239728
label
Alias Tungsten chloride; Tungsten hexachloride
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CAS Number 13283-01-7

science Other reagents with same CAS 13283-01-7

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 396.56 g/mol
Formula WCl₆
badge Registry Numbers
EC Number 236-293-9
MDL Number MFCD00011463
thermostat Physical Properties
Melting Point 275 °C(lit.)
Boiling Point 347 °C(lit.)
inventory_2 Storage & Handling
Density 3.52 g/mL at 25 °C(lit.)
Storage Room temperature, dryness, inert gas storage

description Product Description

Used primarily as a precursor in the synthesis of tungsten-based compounds and catalysts. Plays a key role in chemical vapor deposition (CVD) processes for producing thin films of tungsten and tungsten carbide, which are valued for their hardness and high-temperature stability. Acts as a chlorinating agent in organic and inorganic reactions. Also employed in research for developing new tungsten complexes with potential applications in materials science and catalysis. Highly reactive with moisture, so handling requires inert conditions.

shopping_cart Available Sizes & Pricing

Size Availability Unit Price Quantity
inventory 1g
10-20 days ฿350.00
inventory 10g
10-20 days ฿850.00
inventory 50g
10-20 days ฿3,350.00
inventory 250g
10-20 days ฿9,180.00
inventory 500g
10-20 days ฿14,500.00
inventory 2.5kg
10-20 days ฿54,500.00
Tungsten(VI) chloride
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Used primarily as a precursor in the synthesis of tungsten-based compounds and catalysts. Plays a key role in chemical vapor deposition (CVD) processes for producing thin films of tungsten and tungsten carbide, which are valued for their hardness and high-temperature stability. Acts as a chlorinating agent in organic and inorganic reactions. Also employed in research for developing new tungsten complexes with potential applications in materials science and catalysis. Highly reactive with moisture, so han

Used primarily as a precursor in the synthesis of tungsten-based compounds and catalysts. Plays a key role in chemical vapor deposition (CVD) processes for producing thin films of tungsten and tungsten carbide, which are valued for their hardness and high-temperature stability. Acts as a chlorinating agent in organic and inorganic reactions. Also employed in research for developing new tungsten complexes with potential applications in materials science and catalysis. Highly reactive with moisture, so handling requires inert conditions.

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