Used primarily as a catalyst and precursor in chemical vapor deposition (CVD) processes to produce tungsten metal films for semiconductor manufacturing. These thin tungsten layers serve as conductive contacts in integrated circuits. Also employed in research as a reagent for synthesizing other tungsten compounds due to its high reactivity. Its role in catalysis extends to certain organic transformations, where it facilitates halogenation and oxidation reactions. Requires careful handling due to moisture sensitivity and corrosive nature.