Used as a photoacid generator in advanced photolithography processes, particularly in semiconductor manufacturing. Upon exposure to deep ultraviolet (DUV) or extreme ultraviolet (EUV) light, it releases strong acids that catalyze chemical transformations in photoresist materials, enabling precise pattern development on silicon wafers. Its high thermal stability and efficient acid generation make it suitable for high-resolution imaging and microfabrication. Also employed in cationic polymerization reactions where controlled initiation is required under light exposure.