NF 279 is primarily used as a high-performance solvent in advanced electronic manufacturing processes. It is especially effective in photolithography for semiconductor fabrication due to its ability to dissolve photoresists uniformly while maintaining thermal and chemical stability. Its low residue properties make it ideal for cleaning sensitive microelectronic components without damaging delicate circuitry. Additionally, NF 277 is employed in the production of flat panel displays and precision optics, where consistent coating and minimal particle generation are critical. Its compatibility with various polymer materials also allows use in specialty coatings and thin-film applications requiring high purity and reliability.