Used in photolithography processes for semiconductor manufacturing, enabling high-resolution patterning through its light-sensitive properties. Its nitrobenzyl-derived structure allows controlled release of functional groups upon UV exposure, making it valuable in creating precision microstructures. Also applied in drug delivery research for caging bioactive molecules, where targeted light activation triggers release in cellular environments. Additionally, utilized in polymer chemistry to develop smart materials with tunable degradation or crosslinking behavior under specific wavelengths.