VANADIUM(IV) FLUORIDE

95%

Reagent Code: #245453
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CAS Number 10049-16-8

science Other reagents with same CAS 10049-16-8

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 126.94 g/mol
Formula F₄V
badge Registry Numbers
MDL Number MFCD00042554
thermostat Physical Properties
Melting Point 325℃(dec.)(lit.)
inventory_2 Storage & Handling
Density 2.975 g/cm3t 25℃(lit.)
Storage Room temperature

description Product Description

Used primarily in research and specialized chemical synthesis, this compound serves as a precursor in the preparation of other vanadium compounds. It finds application in catalysis studies, particularly in exploring fluorination reactions and oxidation state transformations. Due to its reactivity with moisture and air, it is handled under controlled conditions, making it suitable for use in sealed systems or inert atmosphere environments. It is also investigated for potential use in electronic materials and semiconductor processes where precise metal fluoride deposition is required.

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Size Availability Unit Price Quantity
inventory 25g
10-20 days ฿37,990.00
inventory 1g
10-20 days ฿2,010.00
inventory 5g
10-20 days ฿9,560.00

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VANADIUM(IV) FLUORIDE
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Used primarily in research and specialized chemical synthesis, this compound serves as a precursor in the preparation of other vanadium compounds. It finds application in catalysis studies, particularly in exploring fluorination reactions and oxidation state transformations. Due to its reactivity with moisture and air, it is handled under controlled conditions, making it suitable for use in sealed systems or inert atmosphere environments. It is also investigated for potential use in electronic materials

Used primarily in research and specialized chemical synthesis, this compound serves as a precursor in the preparation of other vanadium compounds. It finds application in catalysis studies, particularly in exploring fluorination reactions and oxidation state transformations. Due to its reactivity with moisture and air, it is handled under controlled conditions, making it suitable for use in sealed systems or inert atmosphere environments. It is also investigated for potential use in electronic materials and semiconductor processes where precise metal fluoride deposition is required.

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