Used primarily as a monomer in the synthesis of specialty polymers and copolymers, particularly in the production of high-performance resins and photoresists. Its bulky tert-butoxy group provides steric hindrance and enhances thermal stability, making it valuable in semiconductor manufacturing for deep UV lithography. Also employed in the development of functional polymers for optoelectronic devices and as a building block in controlled radical polymerization techniques to create well-defined polymer architectures.