Tetrafluoroboric acid solution

20% in H2O

  • Product Code: 238860
  Alias:    Tetrafluoroboric acid, hydrofluoroboric acid
  CAS:    16872-11-0
Molecular Weight: 87.81 g./mol Molecular Formula: HBF₄
EC Number: MDL Number: MFCD00011345
Melting Point: Boiling Point:
Density: Storage Condition: Room temperature
Product Description: Tetrafluoroboric acid solution is widely used as a catalyst in organic synthesis, particularly in alkylation and acylation reactions. It serves as a source of the non-nucleophilic counterion BF4⁻, making it valuable in reactions where strong acidity without nucleophilic interference is required. It is employed in the preparation of diazonium salts, which are key intermediates in dye and pigment manufacturing. The acid is also used in electroplating processes, especially for aluminum and zinc alloys, where it helps improve bath stability and metal deposition efficiency. In petroleum refining, it acts as a catalyst for isomerization and alkylation of hydrocarbons to produce high-octane fuels. Additionally, it finds use in etching agents for semiconductors and in the synthesis of ionic liquids for specialized industrial applications.
Sizes / Availability / Pricing:
Size Availability Price Quantity
500ml 10-20 days ฿450.00
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10L 10-20 days ฿5,200.00
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-
2.5L 10-20 days ฿1,580.00
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Tetrafluoroboric acid solution
Tetrafluoroboric acid solution is widely used as a catalyst in organic synthesis, particularly in alkylation and acylation reactions. It serves as a source of the non-nucleophilic counterion BF4⁻, making it valuable in reactions where strong acidity without nucleophilic interference is required. It is employed in the preparation of diazonium salts, which are key intermediates in dye and pigment manufacturing. The acid is also used in electroplating processes, especially for aluminum and zinc alloys, where it helps improve bath stability and metal deposition efficiency. In petroleum refining, it acts as a catalyst for isomerization and alkylation of hydrocarbons to produce high-octane fuels. Additionally, it finds use in etching agents for semiconductors and in the synthesis of ionic liquids for specialized industrial applications.
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