Used as a precursor in the production of tantalum oxide (Ta₂O₅) thin films through chemical vapor deposition (CVD) or sol-gel processes. These films are essential in semiconductor devices, particularly in capacitors and gate dielectrics, due to their high dielectric constant and thermal stability. Also employed in the fabrication of optical coatings, where its ability to form dense, transparent layers with high refractive index is valuable. In addition, it serves in the development of corrosion-resistant coatings and is explored in catalysis and nanomaterials synthesis for advanced electronic and photonic applications.